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ADG5433 데이터시트(PDF) 19 Page - Analog Devices |
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ADG5433 데이터시트(HTML) 19 Page - Analog Devices |
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19 / 24 page ![]() Data Sheet ADG5433/ADG5434 Rev. B | Page 19 of 24 TRENCH ISOLATION In the ADG5433/ADG5434, an insulating oxide layer (trench) is placed between the NMOS and the PMOS transistors of each CMOS switch. Parasitic junctions, which occur between the transistors in junction isolated switches, are eliminated, and the result is a completely latch-up proof switch. In junction isolation, the N and P wells of the PMOS and NMOS transistors form a diode that is reverse-biased under normal operation. However, during overvoltage conditions, this diode can become forward-biased. A silicon controlled rectifier (SCR) type circuit is formed by the two transistors causing a significant amplification of the current that, in turn, leads to latch-up. With trench isolation, this diode is removed, and the result is a latch-up proof switch. NMOS PMOS P-WELL N-WELL BURIED OXIDE LAYER HANDLE WAFER TRENCH Figure 36. Trench Isolation |
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